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Micro-fabrication employing UV microstereolithography

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posted on 2023-06-08, 21:16 authored by Chris ChatwinChris Chatwin, Rupert YoungRupert Young, David Budgett, Phil BirchPhil Birch
A new stereophotolithography technique utilizing a spatial light modulator ~SLM! to create threedimensional components with a planar, layer-by-layer process of exposure is described. With this procedure it is possible to build components with dimensions in the range of 50 mm–50 mm and feature sizes as small as 5 mm with a resolution of 1 mm. A polysilicon thin-film twisted nematic SVGA SLM is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. Each of these system components is briefly described. In addition, the optical characteristics of commercially available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins.

History

Publication status

  • Published

File Version

  • Published version

Presentation Type

  • paper

Event name

Materials Opportunities on Layered Manufacturing Technology 2 – (MOLMT-2)

Event location

UMIST, Weston Conference Centre, UMIST, Manchester, UK

Event type

conference

Event date

June 3rd – 6th, 2001

Department affiliated with

  • Engineering and Design Publications

Full text available

  • Yes

Peer reviewed?

  • Yes

Legacy Posted Date

2015-06-29

First Open Access (FOA) Date

2015-06-29

First Compliant Deposit (FCD) Date

2015-06-27

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