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Growth and reactivity of titanium oxide ultrathin films on Ni(110)

journal contribution
posted on 2023-06-07, 22:25 authored by Anthoula Chrysa Papageorgiou, Qiao ChenQiao Chen, Gregory Cabailh, Andrea Resta, Edvin Lundgren, Jesper N Andersen, Geoff Thornton
Soft X-ray photoelectron spectroscopy (SXPS) and X-ray absorption near-edge structure (XANES) have been combined with low-energy electron diffraction (LEED) to examine the growth of titanium dioxide thin films on Ni(110). Depending on the initial titanium coverage, the formation of two different films is observed, a quasi-hexagonal phase and a film with rutile (110) rods. Spectroscopy (SXPS and XANES) results indicate that all films consist of fully oxidized titanium. Furthermore, the reactivity of the higher coverage phase, consisting partly of rutile TiO2(110), was investigated after exposure to molecular water at 190 K. The formation of molecular water and hydroxyls was observed for low-pressure exposure (less than 10(-7) mbar). High-pressure exposure (on the order of 10(-6) mbar) resulted in hydroxylation of the thin film, which was found to be reversible upon annealing.

History

Publication status

  • Published

Journal

Journal of Physical Chemistry C

ISSN

1932-7447

Publisher

American Chemical Society

Issue

21

Volume

111

Page range

7704-7710

Department affiliated with

  • Chemistry Publications

Full text available

  • No

Peer reviewed?

  • Yes

Legacy Posted Date

2012-02-06

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