Large Enhancement of the Third-order Optical Susceptibility in Cu-silica Composites Produced by Low-Energy High-Current Ion Implantation

Olivares, J, Requejo-Isidro, J, del Coso, R, de Nalda, R, Solis, J, Afonso, C N, Stepanov, A L, Hole, D, Townsend, P D and Naudon, A (2001) Large Enhancement of the Third-order Optical Susceptibility in Cu-silica Composites Produced by Low-Energy High-Current Ion Implantation. Journal of Applied Physics, 90 (2). pp. 1064-1066. ISSN 0021-8979

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Item Type: Article
Additional Information: This paper emphasises the importance of ion implantation in the preparation of samples. The paper discusses the importance of the implantation conditions for producing samples with a very large third-order optical susceptibility. All the implantation work for this paper was undertaken by me, employing techniques and controls which I have developed over a number of years for the optimisation of metal nanoclusters in insulators. The third-order susceptibility was one of the largest ever reported, a result which contributes significantly to the body of knowledge which may eventually lead to a potential route to all-optical switching technology.
Schools and Departments: School of Engineering and Informatics > Engineering and Design
Depositing User: EPrints Services
Date Deposited: 06 Feb 2012 19:29
Last Modified: 30 Nov 2012 17:03
URI: http://srodev.sussex.ac.uk/id/eprint/20842
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