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UV Microstereolithography System Employing Spatial Light Modulator Technology

journal contribution
posted on 2023-06-08, 08:01 authored by Chris ChatwinChris Chatwin, Maria Farsari, Shiping Huang, Malcolm Heywood, Philip Birch, Rupert YoungRupert Young, John Richardson
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History

Publication status

  • Published

Journal

Applied Optics

ISSN

0003-6935

Publisher

Optical Society of America

Volume

37 No.

Page range

7514-7522

ISBN

0003-6935

Department affiliated with

  • Engineering and Design Publications

Notes

Invited paper to Special issue on Spatial Light Modulator Technology

Full text available

  • No

Peer reviewed?

  • Yes

Legacy Posted Date

2012-02-06

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