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UV Microstereolithography System Employing Spatial Light Modulator Technology
journal contribution
posted on 2023-06-08, 08:01 authored by Chris ChatwinChris Chatwin, Maria Farsari, Shiping Huang, Malcolm Heywood, Philip Birch, Rupert YoungRupert Young, John RichardsonNo description supplied
History
Publication status
- Published
Journal
Applied OpticsISSN
0003-6935Publisher
Optical Society of AmericaVolume
37 No.Page range
7514-7522ISBN
0003-6935Department affiliated with
- Engineering and Design Publications
Notes
Invited paper to Special issue on Spatial Light Modulator TechnologyFull text available
- No
Peer reviewed?
- Yes
Legacy Posted Date
2012-02-06Usage metrics
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