Chatwin, Chris, Farsari, Maria, Huang, Shiping, Heywood, Malcolm, Birch, Philip, Young, Rupert and Richardson, John (1998) UV microstereolithography system that uses spatial light modulator technology. Applied Optics, 37 (32). pp. 7514-7522. ISSN 0003-6935

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Abstract

A new stereophotolithography technique utilizing a spatial light modulator ~SLM! to create threedimensional
components with a planar, layer-by-layer process of exposure is described. With this
procedure it is possible to build components with dimensions in the range of 50 mm–50 mm and feature
sizes as small as 5 mm with a resolution of 1 mm. A polysilicon thin-film twisted nematic SVGA SLM
is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser
light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system,
a high-resolution translation stage, a control system, and a computer-aided-design system. Each of
these system components is briefly described. In addition, the optical characteristics of commercially
available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings
were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing
speed, shrinkage, and resolution of the resins. These experiments were carried out to prove the suitability
of these photopolymerization systems for microstereolithography.

Item Type:	Article
Keywords:	Microstereolithography,optics, spatial light modulators, UV, microfabrication, photopolymer
Schools and Departments:	School of Engineering and Informatics > Engineering and Design
Subjects:	Q Science T Technology T Technology > T Technology (General) > T0174.7 Nanotechnology T Technology > T Technology (General) > T0175 Industrial research. Research and development
Depositing User:	Chris Chatwin
Date Deposited:	19 Jun 2015 11:57
Last Modified:	08 Mar 2017 08:34
URI:	http://srodev.sussex.ac.uk/id/eprint/50764

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