UMISTmicrosla2__microstereolithography.pdf (3.09 MB)
Micro-fabrication employing UV microstereolithography
presentation
posted on 2023-06-08, 21:16 authored by Chris ChatwinChris Chatwin, Rupert YoungRupert Young, David Budgett, Phil BirchPhil BirchA new stereophotolithography technique utilizing a spatial light modulator ~SLM! to create threedimensional components with a planar, layer-by-layer process of exposure is described. With this procedure it is possible to build components with dimensions in the range of 50 mm–50 mm and feature sizes as small as 5 mm with a resolution of 1 mm. A polysilicon thin-film twisted nematic SVGA SLM is used as the dynamic photolithographic mask. The system consists of eight elements: a UV laser light source, an optical shutter, beam-conditioning optics, a SLM, a multielement reduction lens system, a high-resolution translation stage, a control system, and a computer-aided-design system. Each of these system components is briefly described. In addition, the optical characteristics of commercially available UV curable resins are investigated with nondegenerate four-wave mixing. Holographic gratings were written at a wavelength of 351.1 nm and read at 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins.
History
Publication status
- Published
File Version
- Published version
Presentation Type
- paper
Event name
Materials Opportunities on Layered Manufacturing Technology 2 – (MOLMT-2)Event location
UMIST, Weston Conference Centre, UMIST, Manchester, UKEvent type
conferenceEvent date
June 3rd – 6th, 2001Department affiliated with
- Engineering and Design Publications
Full text available
- Yes
Peer reviewed?
- Yes
Legacy Posted Date
2015-06-29First Open Access (FOA) Date
2015-06-29First Compliant Deposit (FCD) Date
2015-06-27Usage metrics
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